Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/100284
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Type: Journal article
Title: Patterning techniques for metal organic frameworks
Author: Falcaro, P.
Buso, D.
Hill, A.
Doherty, C.
Citation: Advanced Materials, 2012; 24(24):3153-3168
Publisher: Wiley
Issue Date: 2012
ISSN: 0935-9648
1521-4095
Statement of
Responsibility: 
Paolo Falcaro, Dario Buso, Anita J. Hill, and Cara M. Doherty
Abstract: The tuneable pore size and architecture, chemical properties and functionalization make metal organic frameworks (MOFs) attractive versatile stimuli-responsive materials. In this context, MOFs hold promise for industrial applications and a fervent research field is currently investigating MOF properties for device fabrication. Although the material properties have a crucial role, the ability to precisely locate the functional material is fundamental for device fabrication. In this progress report, advancements in the control of MOF positioning and precise localization of functional materials within MOF crystals are presented. Advantages and limitations of each reviewed technique are critically investigated, and several important gaps in the technological development for device fabrication are highlighted. Finally, promising patterning techniques are presented which are inspired by previous studies in organic and inorganic crystal patterning for the future of MOF lithography.
Keywords: Metal organic frameworks (MOFs)
Rights: © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
DOI: 10.1002/adma.201200485
Grant ID: http://purl.org/au-research/grants/arc/DE120102451
http://purl.org/au-research/grants/arc/DP0988106
Appears in Collections:Aurora harvest 3
Chemistry and Physics publications

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