Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/111216
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Type: Journal article
Title: Plasma enhanced vortex fluidic device manipulation of graphene oxide
Author: Jones, D.
Chen, X.
Sibley, A.
Quinton, J.
Shearer, C.
Gibson, C.
Raston, C.
Citation: Chemical Communications, 2016; 52(71):10755-10758
Publisher: Royal Society of Chemistry
Issue Date: 2016
ISSN: 1359-7345
1364-548X
Statement of
Responsibility: 
Darryl B. Jones, Xianjue Chen, Alexander Sibley, Jamie S. Quinton, Cameron J. Shearer, Christopher T. Gibson and Colin L. Raston
Abstract: A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.
Keywords: Oxides; graphite
Rights: This journal is ©The Royal Society of Chemistry 2016
RMID: 0030080304
DOI: 10.1039/c6cc04032b
Appears in Collections:Chemical Engineering publications

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