Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/115852
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Type: Journal article
Title: A self-templated etching route to surface-rough silica nanoparticles for superhydrophobic coatings
Author: Du, X.
He, J.
Citation: ACS Applied Materials and Interfaces, 2011; 3(4):1269-1276
Publisher: American Chemical Society
Issue Date: 2011
ISSN: 1944-8244
1944-8252
Statement of
Responsibility: 
Xin Du and Junhui He
Abstract: A simple, mild, and effective self-templated etching strategy has been developed to directly convert SiO(2) nanospheres into surface-rough SiO(2) (SR-SiO(2)) nanoparticles (NPs) by reaction with NaBH(4). Small SiO(2) NPs on the surface of SR-SiO(2) NPs can be tailored by carefully regulating the reaction time. SiO(2) nanospheres with varied sizes were etched under varied reaction conditions. Subsequently, particulate coatings were constructed on slide glass using SR-SiO(2) NPs as building blocks through the Layer-by-Layer assembly. Slide glasses just coated with two cycles of SR-SiO(2) NPs followed by calcination and hydrophobic modification exhibited superhydrophobicity because of their dual-size surface roughness.
Keywords: Self-templated etching approach; surface-rough SiO2 nanoparticles; layer-by-layer assembly; coatings; superhydrophobicity
Rights: © 2011 American Chemical Society
RMID: 0030018722
DOI: 10.1021/am200079w
Appears in Collections:Chemical Engineering publications

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