Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/124344
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Type: Journal article
Title: Influence of fluoride ion concentrations n the corrosion behavior of Ta2N nanocrystalline coating for dental implant applications
Author: Xu, J.
Ma, J.
Munroe, P.
Xie, Z.
Citation: Surface Review and Letters, 2018; 25(4):1850083-1850083
Publisher: World Scientific Publishing
Issue Date: 2018
ISSN: 0218-625X
1793-6667
Statement of
Responsibility: 
Jiang Xu, Jin Jin Ma, Paul; Munroe, Zong-Han Xie
Abstract: The development of new corrosion-resistant coatings is often challenging, but strongly driven by the potential benefits such coatings hold. A nanostructured Ta2N coating was deposited on a Ti–6Al–4V substrate in an Ar–N atmosphere using a double cathode glow discharge plasma method with the aim being to improve its corrosion resistance in oral environments. The microstructure of the coating was investigated by a range of methods including XRD, SEM-EDS and TEM. The as-deposited coating exhibited densely packed fibrous structure and the individual fibers were composed of equiaxed grains with an average grain size ∼13nm, arranged along the longitudinal axis of the individual fibers. The electrochemical behavior of the Ta2N nanocrystalline coating was characterized in artificial saliva containing different NaF concentrations by a range of electrochemical techniques, including potentiodynamic measurement, EIS, capacitance and PZFC measurements. It was shown that the coating possessed superior corrosion resistance compared to uncoated Ti–6Al–4V, because its passive film exhibited higher stability against the fluoride ion attack.
Keywords: Tantalum nitrides; corrosion resistance; electrochemical impedance; dental application
Rights: Copyright status unknown
DOI: 10.1142/S0218625X1850083X
Appears in Collections:Aurora harvest 4
Mechanical Engineering publications

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