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Type: Journal article
Title: A method for producing uniform dose distributions in the junction regions of large hinge angle electron fields
Author: Zavgorodni, S.
Beckham, W.
Roos, D.
Citation: International Journal of Radiation Oncology, 1996; 35(4):765-770
Publisher: Elsevier Science
Issue Date: 1996
ISSN: 0360-3016
Statement of
Sergel F. Zavgorodni, Wayne A. Beckham, Daniel E. Roos
Abstract: <h4>Purpose</h4>The planning problems presented by abutting electron fields are well recognized. Junctioning electron fields with a large hinge angle compounds the problems because of the creation of closely situated high dose and low-dose regions.<h4>Methods and materials</h4>The technique involving a compensated superficial x-ray (SXR) field to treat the junction region between electron fields was developed and used in a particular clinical case (treatment of a squamous cell carcinoma of the forehead/scalp). The superficial x-ray beam parameters were chosen and the compensator was designed to make the SXR field complementary to the electron fields.<h4>Results</h4>Application of a compensated SXR field eliminated low dose zones in the junction region and reduced high dose zones to 110%. In the clinical case discussed, the high-dose areas due to the SXR field would not appear because of increased attenuation of the soft X-rays in bone.<h4>Conclusion</h4>The technique proposed produces uniform dose distribution up to 3 cm deep and can be considered as an additional tool for dealing with electron field junctioning problems.
Keywords: Dose distribution, Field abutment, Electron beams, Superficial x-ray beam, Compensator
Rights: © 1996 Elsevier Science Ltd.
RMID: 0030003960
DOI: 10.1016/0360-3016(96)00149-6
Appears in Collections:Physics publications

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