Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/127539
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Type: Journal article
Title: Wet chemical etching of single-bore microstructured silicon dioxide fibers
Author: Giddings, J.A.
Stokes, Y.M.
Bachus, K.J.
Ebendorff-Heidepriem, H.
Citation: Physics of Fluids, 2020; 32(7):073314-1-073314-13
Publisher: AIP Publishing
Issue Date: 2020
ISSN: 1070-6631
1089-7666
Statement of
Responsibility: 
Josef A. Giddings, Yvonne M. Stokes, Kyle J. Bachus, and Heike Ebendorff-Heidepriem
Abstract: We model the process of wet chemical etching of the external surface of a single-bore microstructured silicon dioxide fiber in hydrofluoric acid (HFA) while water is pumped through the internal channel to prevent etching of it. The model uses the Stokes flow for the velocity throughout the system and the advection–diffusion equation for the concentration of HFA. We determine the etch rate as a function of HFA concentration using data from experiments designed for this purpose, from which we calculate the change in the fiber surface. We solve our equations using a time-stepping finite-element method and verify our model by comparing to results found experimentally. We investigate the effects of different water flow rates, diffusivity, buoyancy, and bore radius. We find the water being pumped through the bore does not fully protect it and there is some etching of the internal channel, which is difficult to see in experimental images. We also obtain an estimate of the diffusivity of high-concentration HFA in water.
Rights: © 2020 Author(s). Published under license by AIP Publishing
RMID: 1000025448
DOI: 10.1063/5.0014335
Grant ID: http://purl.org/au-research/grants/arc/LP160100657
Appears in Collections:IPAS publications

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