Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/37587
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Type: Journal article
Title: Dry-etch of As₂S₃ thin films for optical waveguide fabrication
Other Titles: Dry-etch of As(2)S(3) thin films for optical waveguide fabrication
Author: Li, W.
Ruan, Y.
Luther-Davies, B.
Rode, A.
Boswell, R.
Citation: Journal of Vacuum Science & Technology A-Vacuum Surfaces and Films, 2005; 23(6):1626-1632
Publisher: Amer Inst Physics
Issue Date: 2005
ISSN: 0734-2101
1520-8559
Statement of
Responsibility: 
Weitang Li, Yinlan Ruan, Barry Luther-Davies, Andrei Rode and Rod Boswell
Description: © 2005 American Vacuum Society
RMID: 0020071274
DOI: 10.1116/1.2049308
Appears in Collections:Physics publications

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