Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/39754
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dc.contributor.authorBiber, S.-
dc.contributor.authorSchneiderbanger, D.-
dc.contributor.authorSchmidt, L.-
dc.contributor.authorWalther, M.-
dc.contributor.authorFischer, B.-
dc.contributor.authorSchwarzer, M.-
dc.contributor.authorJepsen, P.-
dc.date.issued2004-
dc.identifier.citationIRMMW 2004/THz 2004: Conference digest of the Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics, University of Karlsruhe, Karlsruhe, Germany, September 27 - October 1, 2004 / pp. 105-106.-
dc.identifier.isbn0780384903-
dc.identifier.urihttp://hdl.handle.net/2440/39754-
dc.description.abstractA high-resistivity silicon wafer was used to design a broad-band low loss window material for 600 GHz by micromachining an artificial dielectric as a quarter wave transformer on the front and rear side of the wafer. The artificial dielectric is made from a 2-dimensional periodic structure to ensure the same transmission characteristics for horizontally and vertically polarized waves.-
dc.description.statementofresponsibilityBiber, S. ; Schneiderbanger, D. ; Schmidt, L.-P. ; Walther, M. ; Fischer, B. ; Schwarzer, M. ; Jepsen, P.U.-
dc.language.isoen-
dc.publisherIEEE - Institute of Electrical and Electronics Engineers-
dc.rights© Copyright 2004 IEEE-
dc.source.urihttp://dx.doi.org/10.1109/icimw.2004.1421975-
dc.titleLow loss silicon window material for submillimeter waves using micromachined artificial dielectrics for anti-reflection coating-
dc.typeConference paper-
dc.contributor.conferenceInternational Conference on Infrared and Millimeter Waves (29th : 2004 : Karlsruhe, Germany)-
dc.identifier.doi10.1109/ICIMW.2004.1421975-
dc.publisher.placeOnline-
pubs.publication-statusPublished-
Appears in Collections:Aurora harvest
Electrical and Electronic Engineering publications

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