Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/43369
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dc.contributor.authorHeading, E.en
dc.contributor.authorHansen, H.en
dc.contributor.authorParker, M.en
dc.date.issued2007en
dc.identifier.citationProceedings of Smart Materials Nano- and Micro-Smart Systems, 2007;. pp.1-7en
dc.identifier.isbn9780819465221en
dc.identifier.urihttp://hdl.handle.net/2440/43369-
dc.descriptionCopyright © 2007 SPIE - The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.en
dc.description.abstractAccurate characterisation of transmission lines is essential in enabling the design of Monolithic Microwave Integrated Circuits (MMICs) or Radio Frequency Integrated Circuits (RFICs). One RFIC technology currently being pursued is Silicon on Sapphire Complementary Metal Oxide Semiconductor (CMOS) technology. CMOS processes typically involve stacked metal layer structures and the correct method of modelling coplanar waveguides in CMOS is unclear. This paper reports on preliminary studies into electromagnetic design, with an emphasis on correctly predicting losses associated with these structures.en
dc.description.statementofresponsibilityE. Heading, H. J. Hansen and M. E. Parkeren
dc.language.isoenen
dc.publisherSPIEen
dc.relation.ispartofseriesProceedings of SPIE: the International Society for Optical Engineering ; 6414en
dc.titleModelling of coplanar waveguide transmission lines in multiple metal layer processesen
dc.typeConference paperen
dc.provenancePublished online Jan. 11, 2007.en
dc.contributor.conferenceSmart structures, devices, and systems III (2006 : Adelaide, Australia)en
dc.identifier.doi10.1117/12.695676en
dc.publisher.placeUSAen
pubs.publication-statusPublisheden
Appears in Collections:Electrical and Electronic Engineering publications

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