Fabrication and modeling of Ag/TiO2/ITO memristor

Abstract

The nanometer scale feature of memristor created a broad range of opportunities for innovative architectures. The nature of the boundary conditions, the complexity of the ionic transport and tunneling mechanism, and the nanoscale feature of the memristor introduces new challenges in modeling, characterization, and measurements for Memristor-MOS (M2) circuits. These new challenges can be addressed by a joint insight from the circuit designer and device engineers, which will dictate the needed modeling and layout rules to attain an accurate estimation of M2 circuit performance. In this paper, memristive behavior of titanium dioxide (TiO2) is studied using a novel combination of electrodes, silver (Ag) and indium thin oxide (ITO). Fabrication method and a modeling approach are also explained. The ITO electrode provide (a) an excellent transparency in visible light, (b) improved functional reproducibility, and (c) non-volatile characteristics as well as a promising unique application of the M2 circuits in sensory applications. Furthermore, proposed modeling approach shows a good agreement between measurements and simulations of analog memory characteristics and reproducibility as well as long-term retention.