Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/74383
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Type: Journal article
Title: Molecular structure of 3-aminopropyltriethoxysilane layers formed on silanol-terminated silicon surfaces
Author: Acres, R.
Ellis, A.
Alvino, J.
Lenahan, C.
Khodakov, D.
Metha, G.
Andersson, G.
Citation: The Journal of Physical Chemistry C: Energy Conversion and Storage, Optical and Electronic Devices, Interfaces, Nanomaterials, and Hard Matter, 2012; 116(00010):6289-6297
Publisher: American Chemical Society
Issue Date: 2012
ISSN: 1932-7447
1932-7455
Statement of
Responsibility: 
Robert G. Acres, Amanda V. Ellis, Jason Alvino, Claire E. Lenahan, Dmitriy A. Khodakov, Gregory F. Metha, and Gunther G. Andersson
Abstract: The use of the coupling agent, 3-aminopropyltriethoxysilane (APTES), in the silanization reaction with silanol-terminated silicon is an important surface modification reaction. Of particular importance is that the terminal amine functionalities of APTES are sufficiently exposed to the gas or liquid phase for further modifications, such as amide coupling reactions. Here, metastable induced electron spectroscopy (MIES) and UV photoelectron spectroscopy (UPS) were used to study the composition of the outermost layer of a silanol-terminated Si surface after silanization with APTES. High-resolution X-ray photoelectron spectroscopy (XPS) was used to validate the attachment of APTES to the surface. Density of States (DOS) calculations were employed for interpreting the MIE spectra. Findings showed that amine functionalities covered only a small fraction of the APTES-modified Si surface. © 2012 American Chemical Society.
Rights: © 2012 American Chemical Society
DOI: 10.1021/jp212056s
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