Formation of silicate structures in oxidized nickel surfaces using low-temperature plasma reaction
Date
1996
Authors
Arora, P.S.
Smart, R.S.C.
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Journal article
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Surface and Interface Analysis, 1996; 24(9):539-548
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Abstract
Low-temperature plasma reaction with air/water/tetraethylorthosilicate mixtures applied to oxidized nickel surfaces has been shown to produce silicate structures in the oxide layer. A chemically and structurally graded metal/-oxide/silicate/silica layer is formed, reducing the dissolution rate in pH 2 nitric acid by two orders of magnitude over more than 30 days. The mechanism of reaction, via SiO plasma species, has been elucidated using XPS, modified Auger parameter studies, mass spectrometric analysis of the plasma and dissolution rates.
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Copyright 1996 John Wiley & Sons