Saboohi, S.Al Bataineh, S.A.Safizadeh Shirazi, H.Michelmore, A.Whittle, J.D.2025-12-172025-12-172017Plasma Processes and Polymers, 2017; 14(3, article no. 1600054):1-101612-88691612-8869https://hdl.handle.net/11541.2/125709Data source: Supporting information, http://onlinelibrary.wiley.com/doi/10.1002/ppap.201600054/abstract#footer-support-infoThe plasma phase of furfuryl methacrylate (FMA) and its relationship to the surface chemistry of the generated plasma coatings was investigated utilizing mass spectrometry. Positive ion mass spectra from plasma phase and plasma coatings of FMA revealed that furanylmethyl fragment (FM, 81 m/z) has high stability and form oligomers with itself and other species in the plasma phase and on the surface. Combined with ion flux and deposition rate data, the correlation between the normalized intensities of positive fragments from the mass spectra of the neutrals and plasma coatings suggests that neutrals were a major contributor to the plasma film growth. These findings highlight the potential of plasma phase diagnostic tools to predict the chemistry of neutral and positive species, and their role in thin film deposition.enCopyright 2017 WILEY-VCH Verlag GmbH & Co. KGaAfurfuryl methacrylatemass spectrometryplasmasurface chemistryToF-SIMSJournal article10.1002/ppap.2016000542-s2.0-84994310913