Talebi, T.Ghomashchi, R.Talemi, P.Aminorroaya, S.2018-09-212018-09-212018Surface and Coatings Technology, 2018; 343:127-1300257-8972http://hdl.handle.net/2440/114567Fabrication of uniform, crack-free n-type Bi2Te3 films using a fast, cost-effective, electrophoretic deposition method for thermoelectric applications has been reported in this study. The sintering process has been done at 693 K to achieve compact and dense coatings. The microstructures of the surface of the green and sintered films, as well as their thicknesses, have been investigated using SEM, which showed a uniform and even film has resulted using electrophoretic deposition (EPD). Furthermore, the Seebeck coefficients of the green and sintered films have been measured and in-plane Seebeck coefficients of 189 μV/K have been recorded for the sintered film at 500 K.en© 2017 Elsevier B.V. All rights reserved.Electrophoretic deposition; Bi2Te3 thick films; microstructure; sintering; seebeck coefficient; thermoelectric materialsFabrication of n-type Bi₂Te₃ film using electrophoretic deposition for thermoelectric applicationsFabrication of n-type Bi2Te3 film using electrophoretic deposition for thermoelectric applicationsJournal article003007691210.1016/j.surfcoat.2017.10.0170004370664000202-s2.0-85031491117372473Talebi, T. [0000-0001-5597-0643]Ghomashchi, R. [0000-0003-3633-2296]