Xu, J.Lai, D.Wu, J.Xie, Z.Munroe, P.2013-04-092013-04-092012Surface and Coatings Technology, 2012; 206(23):4947-49510257-8972http://hdl.handle.net/2440/76731Nanocrystalline C40-structured (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> films were engineered onto Ti6Al4V substrates by a double glow discharge plasma technique. The electrochemical behavior of the newly developed films in a 3.5wt.% NaCl solution was characterized by electrochemical techniques including open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy. To gain a deeper understanding of the role of Cr alloying in corrosion resistance, both cohesive energy and Mulliken population of the interatomic bonds in C40 (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> were calculated based on the first-principles density-functional theory. © 2012.enCopyright © 2012 Published by Elsevier B.V.Transition metal silicidesFirst-principle calculationCorrosionThin filmsJournal article002012277310.1016/j.surfcoat.2012.05.1160003067202000332-s2.0-8486378416422725