O'Neal, H.Ring, M.Kim, D.King, K.2007-02-202007-02-201995The Journal of physical chemistry, 1995; 99(23):9397-94020022-36541541-5740http://hdl.handle.net/2440/875The thermally induced decomposition of phenylsilane has been investigated by three different experimental methods: a static method, a comparative rate-single pulse shock tube (CR-SPST) method, and a very low-pressure pyrolysis (VLPP) method. Decomposition is mainly heterogeneous under static conditions but appears homogeneous in the other two systems. Homogeneous dissociations occur by two channels with yields, PhSiH<inf>3</inf> →¹ H<inf>2</inf> + PhSiH, φ<inf>1</inf> ∼ 0.84 ± 0.04; PhSiH<inf>3</inf> →² PhH + SiH<inf>2</inf>, φ<inf>2</inf> ∼ 0.16 ± 0.04. Coupling of CR-SPST and homogeneous static reactor data spanning temperatures from 693 to 1236 K for the benzene formation channel and adjusting for falloff by RRKM methods gives high-pressure Arrhenius parameters of A<inf>1</inf> = 10^14.0±0.4, E<inf>1</inf>= 59.3 ± 2.1 and A<inf>2</inf> = 10^13.9±0.2, E<inf>2</inf> = 62.0 ± 0.9 (A in s^-1 and E in kcal/mol) for the two primary dissociation channels. These parameters yield RRKM calculated rate constants under VLPP conditions which agree within the errors with experimental rate constants. © 1995 American Chemical Society.enJournal article003000307510.1021/j100023a015A1995RC459000152-s2.0-000144299767081King, K. [0000-0003-2766-2330]