Al Qahtani, H.Metha, G.Walsh, R.Golovko, V.Andersson, G.Nakayama, T.2018-09-122018-09-122017The Journal of Physical Chemistry C: Energy Conversion and Storage, Optical and Electronic Devices, Interfaces, Nanomaterials, and Hard Matter, 2017; 121(20):10781-107891932-74471932-7455http://hdl.handle.net/2440/114381[Au₉(PPh₃)₈)](NO₃)₃ (Au)₉ clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au₉ clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au₉ clusters due to the annealing process. Both AFM and XPS show that the Au₉ clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au₉(PPh₃)₈)](NO₃)₃ clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.en© 2017 American Chemical SocietyAggregation behavior of ligand-protected Au₉ clusters on sputtered atomic layer deposition TiO₂Aggregation behavior of ligand-protected Au(9) clusters on sputtered atomic layer deposition TiO(2)Journal article003007216210.1021/acs.jpcc.6b115900004024977000212-s2.0-85020722902358789Metha, G. [0000-0003-1094-0947]