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Type: Journal article
Title: Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing
Author: Malfatti, L.
Pinna, A.
Enzo, S.
Falcaro, P.
Marmiroli, B.
Innocenzi, P.
Citation: Journal of Synchrotron Radiation, 2015; 22(1):165-171
Publisher: Wiley-Blackwell
Issue Date: 2015
ISSN: 0909-0495
Statement of
Luca Malfatti, Alessandra Pinna, Stefano Enzo, Paolo Falcaro, Benedetta Marmiroli and Plinio Innocenzi
Abstract: An innovative approach towards the physico-chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol-gel method and then exposed to hard X-rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy-to-pattern films made by an organic-inorganic matrix to be deposited. The exposure to hard X-rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite-like structure. At the same time, X-ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.
Keywords: bottom-up/top-down
thin film
zinc oxide
Rights: © 2015 International Union of Crystallography
DOI: 10.1107/S1600577514024047
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Physics publications

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