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|Title:||Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing|
|Citation:||Journal of Synchrotron Radiation, 2015; 22(1):165-171|
|Luca Malfatti, Alessandra Pinna, Stefano Enzo, Paolo Falcaro, Benedetta Marmiroli and Plinio Innocenzi|
|Abstract:||An innovative approach towards the physico-chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol-gel method and then exposed to hard X-rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy-to-pattern films made by an organic-inorganic matrix to be deposited. The exposure to hard X-rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite-like structure. At the same time, X-ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.|
|Rights:||© 2015 International Union of Crystallography|
|Appears in Collections:||Aurora harvest 3|
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