Please use this identifier to cite or link to this item:
https://hdl.handle.net/2440/100403
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DC Field | Value | Language |
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dc.contributor.author | Doherty, C. | - |
dc.contributor.author | Grenci, G. | - |
dc.contributor.author | Riccò, R. | - |
dc.contributor.author | Mardel, J. | - |
dc.contributor.author | Reboul, J. | - |
dc.contributor.author | Furukawa, S. | - |
dc.contributor.author | Kitagawa, S. | - |
dc.contributor.author | Hill, A. | - |
dc.contributor.author | Falcaro, P. | - |
dc.date.issued | 2013 | - |
dc.identifier.citation | Advanced Materials, 2013; 25(34):4701-4705 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.issn | 1521-4095 | - |
dc.identifier.uri | http://hdl.handle.net/2440/100403 | - |
dc.description.abstract | Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices. | - |
dc.description.statementofresponsibility | Cara M. Doherty, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul,Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, and Paolo Falcaro | - |
dc.language.iso | en | - |
dc.publisher | Wiley | - |
dc.rights | © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | - |
dc.source.uri | http://dx.doi.org/10.1002/adma.201301383 | - |
dc.subject | UV lithography; organic imprinting | - |
dc.title | Combining UV lithography and an imprinting technique for patterning metal-organic frameworks | - |
dc.type | Journal article | - |
dc.identifier.doi | 10.1002/adma.201301383 | - |
dc.relation.grant | http://purl.org/au-research/grants/arc/DE120102451 | - |
pubs.publication-status | Published | - |
Appears in Collections: | Aurora harvest 3 Chemical Engineering publications |
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