Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/100403
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dc.contributor.authorDoherty, C.-
dc.contributor.authorGrenci, G.-
dc.contributor.authorRiccò, R.-
dc.contributor.authorMardel, J.-
dc.contributor.authorReboul, J.-
dc.contributor.authorFurukawa, S.-
dc.contributor.authorKitagawa, S.-
dc.contributor.authorHill, A.-
dc.contributor.authorFalcaro, P.-
dc.date.issued2013-
dc.identifier.citationAdvanced Materials, 2013; 25(34):4701-4705-
dc.identifier.issn0935-9648-
dc.identifier.issn1521-4095-
dc.identifier.urihttp://hdl.handle.net/2440/100403-
dc.description.abstractThin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.-
dc.description.statementofresponsibilityCara M. Doherty, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul,Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, and Paolo Falcaro-
dc.language.isoen-
dc.publisherWiley-
dc.rights© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim-
dc.source.urihttp://dx.doi.org/10.1002/adma.201301383-
dc.subjectUV lithography; organic imprinting-
dc.titleCombining UV lithography and an imprinting technique for patterning metal-organic frameworks-
dc.typeJournal article-
dc.identifier.doi10.1002/adma.201301383-
dc.relation.granthttp://purl.org/au-research/grants/arc/DE120102451-
pubs.publication-statusPublished-
Appears in Collections:Aurora harvest 3
Chemical Engineering publications

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