Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/114381
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Type: Journal article
Title: Aggregation behavior of ligand-protected Au₉ clusters on sputtered atomic layer deposition TiO₂
Other Titles: Aggregation behavior of ligand-protected Au(9) clusters on sputtered atomic layer deposition TiO(2)
Author: Al Qahtani, H.
Metha, G.
Walsh, R.
Golovko, V.
Andersson, G.
Nakayama, T.
Citation: The Journal of Physical Chemistry C: Energy Conversion and Storage, Optical and Electronic Devices, Interfaces, Nanomaterials, and Hard Matter, 2017; 121(20):10781-10789
Publisher: American Chemical Society
Issue Date: 2017
ISSN: 1932-7447
1932-7455
Statement of
Responsibility: 
Hassan S. Al Qahtani, Gregory F. Metha, Rick B. Walsh, Vladimir B. Golovko, Gunther G. Andersson, and Tomonobu Nakayama
Abstract: [Au₉(PPh₃)₈)](NO₃)₃ (Au)₉ clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au₉ clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au₉ clusters due to the annealing process. Both AFM and XPS show that the Au₉ clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au₉(PPh₃)₈)](NO₃)₃ clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.
Rights: © 2017 American Chemical Society
DOI: 10.1021/acs.jpcc.6b11590
Published version: http://dx.doi.org/10.1021/acs.jpcc.6b11590
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