Oxidation resistance of Mo(Si₁-ₓAlₓ)₂ nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy

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dc.contributor.authorXu, J.
dc.contributor.authorLi, Z.
dc.contributor.authorMunroe, P.
dc.contributor.authorXie, Z.
dc.date.issued2014
dc.description.abstractTo explore the influence of Al alloying on the oxidation resistance of MoSi2, four Mo(Si₁-ₓAlₓ)₂ nanocrystalline films, with differing Al contents, were fabricated on Ti–6A1–4V substrates by a doublecathode glow discharge technique and their cyclic oxidation behavior was characterized at 500 °C in air. The oxidation kinetics of the four Mo(Si₁-ₓAlₓ)₂ films was found to obey a subparabolic behavior with respect to the overall exposure, and their oxidation resistance was improved by Al additions. On the other hand, the electrochemical behavior of the oxide scales developed on the four Mo(Si₁-ₓAlₓ)2 nanocrystalline films in a 3.5 wt% NaCl solution was studied using electrochemical-impedance spectroscopy (EIS). The impedance data showed that with increasing oxidation time, the oxide scales transformed from a homogeneous and dense structure to a duplex structure consisting of a porous outer layer and a denser inner layer. The resistance of the oxide scales increased with increasing Al addition, implying an enhanced protective ability of the oxide scales by Al alloying in media containing chlorine ions. The findings represent a step forward in improving the surface integrity of alloy components used in the hot zones of jet engines.
dc.description.statementofresponsibilityJiang Xu, ZhengYang Li, Paul Munroe and Zong-Han Xie
dc.identifier.citationRSC Advances: an international journal to further the chemical sciences, 2014; 4(99):55696-55708
dc.identifier.doi10.1039/c4ra10570b
dc.identifier.issn2046-2069
dc.identifier.issn2046-2069
dc.identifier.urihttp://hdl.handle.net/2440/105218
dc.language.isoen
dc.publisherRoyal Society of Chemistry
dc.rightsThis journal is © The Royal Society of Chemistry 2014
dc.source.urihttps://doi.org/10.1039/c4ra10570b
dc.titleOxidation resistance of Mo(Si₁-ₓAlₓ)₂ nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy
dc.title.alternativeOxidation resistance of Mo(Si(1)-(x)Al(x))(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy
dc.typeJournal article
pubs.publication-statusPublished

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