Primary reaction channels and kinetics of the thermal decomposition of phenylsilane

dc.contributor.authorO'Neal, H.
dc.contributor.authorRing, M.
dc.contributor.authorKim, D.
dc.contributor.authorKing, K.
dc.date.issued1995
dc.description.abstractThe thermally induced decomposition of phenylsilane has been investigated by three different experimental methods: a static method, a comparative rate-single pulse shock tube (CR-SPST) method, and a very low-pressure pyrolysis (VLPP) method. Decomposition is mainly heterogeneous under static conditions but appears homogeneous in the other two systems. Homogeneous dissociations occur by two channels with yields, PhSiH<inf>3</inf> →<sup>1</sup> H<inf>2</inf> + PhSiH, φ<inf>1</inf> ∼ 0.84 ± 0.04; PhSiH<inf>3</inf> →<sup>2</sup> PhH + SiH<inf>2</inf>, φ<inf>2</inf> ∼ 0.16 ± 0.04. Coupling of CR-SPST and homogeneous static reactor data spanning temperatures from 693 to 1236 K for the benzene formation channel and adjusting for falloff by RRKM methods gives high-pressure Arrhenius parameters of A<inf>1</inf> = 10<sup>14.0±0.4</sup>, E<inf>1</inf>= 59.3 ± 2.1 and A<inf>2</inf> = 10<sup>13.9±0.2</sup>, E<inf>2</inf> = 62.0 ± 0.9 (A in s<sup>-1</sup> and E in kcal/mol) for the two primary dissociation channels. These parameters yield RRKM calculated rate constants under VLPP conditions which agree within the errors with experimental rate constants. © 1995 American Chemical Society.
dc.identifier.citationThe Journal of physical chemistry, 1995; 99(23):9397-9402
dc.identifier.doi10.1021/j100023a015
dc.identifier.issn0022-3654
dc.identifier.issn1541-5740
dc.identifier.orcidKing, K. [0000-0003-2766-2330]
dc.identifier.urihttp://hdl.handle.net/2440/875
dc.language.isoen
dc.publisherAmerican Chemical Society
dc.source.urihttps://doi.org/10.1021/j100023a015
dc.titlePrimary reaction channels and kinetics of the thermal decomposition of phenylsilane
dc.typeJournal article
pubs.publication-statusPublished

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