Current studentsExisting staffContact us
 

The mechanism of low temperature deposition of crystalline anatase by reactive DC magnetron sputtering

Simple item page
dc.contributor.authorBarnes, M.C.
dc.contributor.authorKumar, S.
dc.contributor.authorGreen, L.K.
dc.contributor.authorHwang, N.M.
dc.contributor.authorGerson, A.R.
dc.date.issued2005
dc.identifier.citationSurface and Coatings Technology, 2005; 190(2-3):321-330
dc.identifier.doi10.1016/j.surfcoat.2004.04.003
dc.identifier.issn0257-8972
dc.identifier.urihttps://hdl.handle.net/1959.8/27188
dc.language.isoen
dc.publisherElsevier BV
dc.rightsCopyright status unknown
dc.source.urihttps://doi.org/10.1016/j.surfcoat.2004.04.003
dc.titleThe mechanism of low temperature deposition of crystalline anatase by reactive DC magnetron sputtering
dc.typeJournal article
pubs.publication-statusPublished
ror.mmsid9915912109501831

Files

Collections