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Type: Journal article
Title: Combining UV lithography and an imprinting technique for patterning metal-organic frameworks
Author: Doherty, C.
Grenci, G.
Riccò, R.
Mardel, J.
Reboul, J.
Furukawa, S.
Kitagawa, S.
Hill, A.
Falcaro, P.
Citation: Advanced Materials, 2013; 25(34):4701-4705
Publisher: Wiley
Issue Date: 2013
ISSN: 0935-9648
Statement of
Cara M. Doherty, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul,Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, and Paolo Falcaro
Abstract: Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.
Keywords: UV lithography; organic imprinting
Rights: © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
DOI: 10.1002/adma.201301383
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Appears in Collections:Aurora harvest 3
Chemical Engineering publications

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