Modelling of coplanar waveguide transmission lines in multiple metal layer processes

Abstract

Accurate characterisation of transmission lines is essential in enabling the design of Monolithic Microwave Integrated Circuits (MMICs) or Radio Frequency Integrated Circuits (RFICs). One RFIC technology currently being pursued is Silicon on Sapphire Complementary Metal Oxide Semiconductor (CMOS) technology. CMOS processes typically involve stacked metal layer structures and the correct method of modelling coplanar waveguides in CMOS is unclear. This paper reports on preliminary studies into electromagnetic design, with an emphasis on correctly predicting losses associated with these structures.