Plasma enhanced vortex fluidic device manipulation of graphene oxide

Date

2016

Authors

Jones, D.
Chen, X.
Sibley, A.
Quinton, J.
Shearer, C.
Gibson, C.
Raston, C.

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Journal article

Citation

Chemical Communications, 2016; 52(71):10755-10758

Statement of Responsibility

Darryl B. Jones, Xianjue Chen, Alexander Sibley, Jamie S. Quinton, Cameron J. Shearer, Christopher T. Gibson and Colin L. Raston

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Abstract

A vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.

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This journal is ©The Royal Society of Chemistry 2016

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