Plasma enhanced vortex fluidic device manipulation of graphene oxide

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dc.contributor.authorJones, D.
dc.contributor.authorChen, X.
dc.contributor.authorSibley, A.
dc.contributor.authorQuinton, J.
dc.contributor.authorShearer, C.
dc.contributor.authorGibson, C.
dc.contributor.authorRaston, C.
dc.date.issued2016
dc.description.abstractA vortex fluid device (VFD) with non-thermal plasma liquid processing within dynamic thin films has been developed. This plasma-liquid microfluidic platform facilitates chemical processing which is demonstrated through the manipulation of the morphology and chemical character of colloidal graphene oxide in water.
dc.description.statementofresponsibilityDarryl B. Jones, Xianjue Chen, Alexander Sibley, Jamie S. Quinton, Cameron J. Shearer, Christopher T. Gibson and Colin L. Raston
dc.identifier.citationChemical Communications, 2016; 52(71):10755-10758
dc.identifier.doi10.1039/c6cc04032b
dc.identifier.issn1359-7345
dc.identifier.issn1364-548X
dc.identifier.orcidShearer, C. [0000-0002-8192-3696]
dc.identifier.orcidGibson, C. [0000-0003-3334-5059]
dc.identifier.urihttp://hdl.handle.net/2440/111216
dc.language.isoen
dc.publisherRoyal Society of Chemistry
dc.relation.grantARC
dc.rightsThis journal is ©The Royal Society of Chemistry 2016
dc.source.urihttps://doi.org/10.1039/c6cc04032b
dc.subjectOxides; graphite
dc.titlePlasma enhanced vortex fluidic device manipulation of graphene oxide
dc.typeJournal article
pubs.publication-statusPublished

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