The importance of ions in low pressure PECVD plasmas
Files
(Published version)
Date
2015
Authors
Michelmore, A.
Whittle, J.D.
Short, R.D.
Editors
Advisors
Journal Title
Journal ISSN
Volume Title
Type:
Journal article
Citation
Frontiers in Physics, 2015; 3(article no. 3):1-5
Statement of Responsibility
Conference Name
Abstract
Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaceswith a wide range of physical and chemical properties and are used in a variety ofapplications. Despite this, the mechanisms by which PECVD films grow are not wellunderstood. Moreover, the species which contribute to film growth can be consideredquite differently depending on the process. Particularly for functionalized plasma polymerfilms, the growth mechanisms are considered with respect to the chemistry of thedepositing species, ignoring the physics of plasmas. Here we analyse the role ions playin the deposition of three common classes of depositing plasmas, and how these closelyrelated fields treat ions very differently.
School/Discipline
Dissertation Note
Provenance
Description
Access Status
Rights
Copyright 2015 The Authors. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.