The importance of ions in low pressure PECVD plasmas
| dc.contributor.author | Michelmore, A. | |
| dc.contributor.author | Whittle, J.D. | |
| dc.contributor.author | Short, R.D. | |
| dc.date.issued | 2015 | |
| dc.description.abstract | Plasma enhanced chemical vapor deposition (PECVD) can be used to fabricate surfaceswith a wide range of physical and chemical properties and are used in a variety ofapplications. Despite this, the mechanisms by which PECVD films grow are not wellunderstood. Moreover, the species which contribute to film growth can be consideredquite differently depending on the process. Particularly for functionalized plasma polymerfilms, the growth mechanisms are considered with respect to the chemistry of thedepositing species, ignoring the physics of plasmas. Here we analyse the role ions playin the deposition of three common classes of depositing plasmas, and how these closelyrelated fields treat ions very differently. | |
| dc.identifier.citation | Frontiers in Physics, 2015; 3(article no. 3):1-5 | |
| dc.identifier.doi | 10.3389/fphy.2015.00003 | |
| dc.identifier.issn | 2296-424X | |
| dc.identifier.issn | 2296-424X | |
| dc.identifier.uri | https://hdl.handle.net/11541.2/112539 | |
| dc.language.iso | en | |
| dc.publisher | Frontiers Research Foundation | |
| dc.rights | Copyright 2015 The Authors. This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) or licensor are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms. | |
| dc.source.uri | https://doi.org/10.3389/fphy.2015.00003 | |
| dc.subject | PECVD | |
| dc.subject | ions | |
| dc.subject | silanes | |
| dc.subject | diamond-like carbon | |
| dc.subject | plasma polymers | |
| dc.title | The importance of ions in low pressure PECVD plasmas | |
| dc.type | Journal article | |
| pubs.publication-status | Published | |
| ror.fileinfo | 12143335440001831 13143333230001831 9915908386301831_53109755270001831.pdf | |
| ror.mmsid | 9915908386301831 |
Files
Original bundle
1 - 1 of 1
No Thumbnail Available
- Name:
- 9915908386301831_53109755270001831.pdf
- Size:
- 620.76 KB
- Format:
- Adobe Portable Document Format
- Description:
- Published version