Fabrication of n-type Bi₂Te₃ film using electrophoretic deposition for thermoelectric applications

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dc.contributor.authorTalebi, T.
dc.contributor.authorGhomashchi, R.
dc.contributor.authorTalemi, P.
dc.contributor.authorAminorroaya, S.
dc.date.issued2018
dc.description.abstractFabrication of uniform, crack-free n-type Bi2Te3 films using a fast, cost-effective, electrophoretic deposition method for thermoelectric applications has been reported in this study. The sintering process has been done at 693 K to achieve compact and dense coatings. The microstructures of the surface of the green and sintered films, as well as their thicknesses, have been investigated using SEM, which showed a uniform and even film has resulted using electrophoretic deposition (EPD). Furthermore, the Seebeck coefficients of the green and sintered films have been measured and in-plane Seebeck coefficients of 189 μV/K have been recorded for the sintered film at 500 K.
dc.description.statementofresponsibilityTahereh Talebi, Reza Ghomashchi, PejmanTalemi, Sima Aminorroaya
dc.identifier.citationSurface and Coatings Technology, 2018; 343:127-130
dc.identifier.doi10.1016/j.surfcoat.2017.10.017
dc.identifier.issn0257-8972
dc.identifier.orcidTalebi, T. [0000-0001-5597-0643]
dc.identifier.orcidGhomashchi, R. [0000-0003-3633-2296]
dc.identifier.urihttp://hdl.handle.net/2440/114567
dc.language.isoen
dc.publisherElsevier
dc.rights© 2017 Elsevier B.V. All rights reserved.
dc.source.urihttps://doi.org/10.1016/j.surfcoat.2017.10.017
dc.subjectElectrophoretic deposition; Bi2Te3 thick films; microstructure; sintering; seebeck coefficient; thermoelectric materials
dc.titleFabrication of n-type Bi₂Te₃ film using electrophoretic deposition for thermoelectric applications
dc.title.alternativeFabrication of n-type Bi2Te3 film using electrophoretic deposition for thermoelectric applications
dc.typeJournal article
pubs.publication-statusPublished

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