Enhanced corrosion-resistance in nanocrystalline MoSi₂ films enabled by Cr additions
Date
2012
Authors
Xu, J.
Lai, D.
Wu, J.
Xie, Z.
Munroe, P.
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Journal article
Citation
Surface and Coatings Technology, 2012; 206(23):4947-4951
Statement of Responsibility
Jiang Xu, Daohui Lai, Jiadi Wu, Zonghan Xie, Paul Munroe
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Abstract
Nanocrystalline C40-structured (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> films were engineered onto Ti6Al4V substrates by a double glow discharge plasma technique. The electrochemical behavior of the newly developed films in a 3.5wt.% NaCl solution was characterized by electrochemical techniques including open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy. To gain a deeper understanding of the role of Cr alloying in corrosion resistance, both cohesive energy and Mulliken population of the interatomic bonds in C40 (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> were calculated based on the first-principles density-functional theory. © 2012.
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Copyright © 2012 Published by Elsevier B.V.