Enhanced corrosion-resistance in nanocrystalline MoSi₂ films enabled by Cr additions

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dc.contributor.authorXu, J.
dc.contributor.authorLai, D.
dc.contributor.authorWu, J.
dc.contributor.authorXie, Z.
dc.contributor.authorMunroe, P.
dc.date.issued2012
dc.description.abstractNanocrystalline C40-structured (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> films were engineered onto Ti6Al4V substrates by a double glow discharge plasma technique. The electrochemical behavior of the newly developed films in a 3.5wt.% NaCl solution was characterized by electrochemical techniques including open circuit potential, potentiodynamic polarization, and electrochemical impedance spectroscopy. To gain a deeper understanding of the role of Cr alloying in corrosion resistance, both cohesive energy and Mulliken population of the interatomic bonds in C40 (Mo <inf>1-x</inf>Cr <inf>x</inf>)Si <inf>2</inf> were calculated based on the first-principles density-functional theory. © 2012.
dc.description.statementofresponsibilityJiang Xu, Daohui Lai, Jiadi Wu, Zonghan Xie, Paul Munroe
dc.identifier.citationSurface and Coatings Technology, 2012; 206(23):4947-4951
dc.identifier.doi10.1016/j.surfcoat.2012.05.116
dc.identifier.issn0257-8972
dc.identifier.urihttp://hdl.handle.net/2440/76731
dc.language.isoen
dc.publisherElsevier Science SA
dc.rightsCopyright © 2012 Published by Elsevier B.V.
dc.source.urihttps://doi.org/10.1016/j.surfcoat.2012.05.116
dc.subjectTransition metal silicides
dc.subjectFirst-principle calculation
dc.subjectCorrosion
dc.subjectThin films
dc.titleEnhanced corrosion-resistance in nanocrystalline MoSi₂ films enabled by Cr additions
dc.title.alternativeEnhanced corrosion-resistance in nanocrystalline MoSi(2) films enabled by Cr additions
dc.typeJournal article
pubs.publication-statusPublished

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