Tailoring Tamm Plasmon Resonances in Dielectric Nanoporous Photonic Crystals
Date
2024
Authors
Tran, H.N.Q.
Tran, K.N.
Gunenthiran, S.
Wang, J.
Law, C.S.
Lim, S.Y.
Gary Lim, Y.C.
Abell, A.D.
Marsal, L.F.
Santos, A.
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Journal article
Citation
ACS applied materials & interfaces, 2024; 16(9):11787-11799
Statement of Responsibility
Huong Nguyen Que Tran, Khoa Nhu Tran, Satyathiran Gunenthiran, Juan Wang, Cheryl Suwen Law, Siew Yee Lim, Yong Cheow Gary Lim, Andrew D. Abell, Lluis F. Marsal, and Abel Santos
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Abstract
The fields of plasmonics and photonic crystals (PCs) have been combined to generate model light-confining Tamm plasmon (TMM) cavities. This approach effectively overcomes the intrinsic limit of diffraction faced by dielectric cavities and mitigates losses associated with the inherent properties of plasmonic materials. In this study, nanoporous anodic alumina PCs, produced by two-step sinusoidal pulse anodization, are used as a model dielectric platform to establish the methodology for tailoring light confinement through TMM resonances. These model dielectric mirrors feature highly organized nanopores and narrow bandwidth photonic stopbands (PSBs) across different positions of the spectrum. Different types of metallic films (gold, silver, and aluminum) were coated on the top of these model dielectric mirrors. By structuring the features of the plasmonic and photonic components of these hybrid structures, the characteristics of TMM resonances were studied to elucidate effective approaches to optimize the light-confining capability of this hybrid TMM model system. Our findings indicate that the coupling of photonic and plasmonic modes is maximized when the PSB of the model dielectric mirror is broad and located within the midvisible region. It was also found that thicker metal films enhance the quality of the confined light. Gas sensing experiments were performed on optimized TMM systems, and their sensitivity was assessed in real time to demonstrate their applicability. Ag films provide superior performance in achieving the highest sensitivity (S = 0.038 ± 0.001 nm ppm(-1)) based on specific binding interactions between thiol-containing molecules and metal films.
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© 2024 American Chemical Society