Aggregation behavior of ligand-protected Au₉ clusters on sputtered atomic layer deposition TiO₂

dc.contributor.authorAl Qahtani, H.
dc.contributor.authorMetha, G.
dc.contributor.authorWalsh, R.
dc.contributor.authorGolovko, V.
dc.contributor.authorAndersson, G.
dc.contributor.authorNakayama, T.
dc.date.issued2017
dc.description.abstract[Au₉(PPh₃)₈)](NO₃)₃ (Au)₉ clusters were deposited onto sputtered ALD titania surfaces. Atomic force microscopy (AFM) was used to determine the height and distributions of the Au₉ clusters over the titania surface fabricated using atomic layer deposition (ALD). Synchrotron X-ray photoelectron spectroscopy (XPS) was used to derive information about the degree of agglomeration of the Au₉ clusters due to the annealing process. Both AFM and XPS show that the Au₉ clusters deposited on ALD titania are partially agglomerated after annealing. Deposition of the [Au₉(PPh₃)₈)](NO₃)₃ clusters on sputtered ALD titania is compared with deposition of the same cluster on titania nanosheets of previous work.
dc.description.statementofresponsibilityHassan S. Al Qahtani, Gregory F. Metha, Rick B. Walsh, Vladimir B. Golovko, Gunther G. Andersson, and Tomonobu Nakayama
dc.identifier.citationThe Journal of Physical Chemistry C: Energy Conversion and Storage, Optical and Electronic Devices, Interfaces, Nanomaterials, and Hard Matter, 2017; 121(20):10781-10789
dc.identifier.doi10.1021/acs.jpcc.6b11590
dc.identifier.issn1932-7447
dc.identifier.issn1932-7455
dc.identifier.orcidMetha, G. [0000-0003-1094-0947]
dc.identifier.urihttp://hdl.handle.net/2440/114381
dc.language.isoen
dc.publisherAmerican Chemical Society
dc.rights© 2017 American Chemical Society
dc.source.urihttps://doi.org/10.1021/acs.jpcc.6b11590
dc.titleAggregation behavior of ligand-protected Au₉ clusters on sputtered atomic layer deposition TiO₂
dc.title.alternativeAggregation behavior of ligand-protected Au(9) clusters on sputtered atomic layer deposition TiO(2)
dc.typeJournal article
pubs.publication-statusPublished

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