The microstructure and mechanical properties of tantalum nitride coatings deposited by a plasma assisted bias sputtering deposition process

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dc.contributor.authorXu, S.
dc.contributor.authorMunroe, P.
dc.contributor.authorXu, J.
dc.contributor.authorXie, Z.
dc.date.issued2016
dc.description.abstractAbstract not available
dc.description.statementofresponsibilitySong Xu, Paul Munroe, Jiang Xu, Zong-Han Xie
dc.identifier.citationSurface and Coatings Technology, 2016; 307:470-475
dc.identifier.doi10.1016/j.surfcoat.2016.09.015
dc.identifier.issn0257-8972
dc.identifier.urihttp://hdl.handle.net/2440/104070
dc.language.isoen
dc.publisherElsevier
dc.relation.granthttp://purl.org/au-research/grants/arc/DP150102417
dc.rights© 2016 Elsevier B.V. All rights reserved.
dc.source.urihttps://doi.org/10.1016/j.surfcoat.2016.09.015
dc.subjectTantalum nitride coating; microstructure; mechanical property; nanoporosity; toughness
dc.titleThe microstructure and mechanical properties of tantalum nitride coatings deposited by a plasma assisted bias sputtering deposition process
dc.typeJournal article
pubs.publication-statusPublished

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