Atomic layer deposition of SiO₂ on porous alumina membranes: Controlling the pore size and transport properties

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dc.contributor.authorVelleman, L.
dc.contributor.authorTriani, G.
dc.contributor.authorEvans, P.
dc.contributor.authorAtanacio, A.
dc.contributor.authorShapter, J.
dc.contributor.authorLosic, D.
dc.contributor.conferenceSPIE: Smart Materials, Nano+Micro-Smart Systems (8 Dec 2008 - 10 Dec 2008 : Melbourne, VIC)
dc.contributor.editorVoelcker, N.H.
dc.contributor.editorThissen, H.W.
dc.date.issued2008
dc.description.abstractAtomic layer deposition (ALD) of SiO<sup>2</sup> onto nanoporous alumina (PA) membranes was investigated with the aim of adjusting the pore size and transport properties. PA membranes from commercial sources with a range of pore diameters (20 nm, 100 nm and 200 nm) were used and modified by atomic layer deposition using tris(tert-butoxy)silanol and water as the precursor couple. By adjusting the number of deposition cycles, the thickness of the conformal silica coating was controlled, reducing the effective pore diameter, and subsequently changing the transport properties of the PA membrane. Silica coated PA membranes with desired pore diameters from <5 nm to 100 nm were fabricated. In addition to the pore size, the transport properties and selectivity of fabricated silica coated PA membranes were controlled by chemical functionalisation using a silane with hydrophobic properties. Structural and chemical properties of modified membranes were studied by dynamic secondary ion mass spectrometry (DSIMS) and scanning electron microscopy (SEM). Spectrophotometric methods were used to evaluate the transport properties and selectivity of silica coated membranes by permeation studies of hydrophobic and hydrophilic organic molecules. The resultant silica/PA membranes with specific surface chemistry and controlled pore size are applicable for molecular separation, cell culture, bioreactors, biosensing and drug delivery. © 2008 SPIE.
dc.description.statementofresponsibilityLeonora Velleman, Gerry Triani, Peter J. Evans, Armand Atanacio, Joe G. Shapter, and Dusan Losic
dc.identifier.citationProceedings of SPIE, 2008 / Voelcker, N.H., Thissen, H.W. (ed./s), vol.7267, pp.1-8
dc.identifier.doi10.1117/12.810716
dc.identifier.isbn9780819475190
dc.identifier.issn0277-786X
dc.identifier.issn1996-756X
dc.identifier.orcidLosic, D. [0000-0002-1930-072X]
dc.identifier.urihttp://hdl.handle.net/2440/87947
dc.language.isoen
dc.publisherSociety of Photo-optical Instrumentation Engineers
dc.publisher.placeAustralia
dc.relation.ispartofseriesProceedings of SPIE
dc.rights© 2008 SPIE
dc.source.urihttps://doi.org/10.1117/12.810716
dc.subjectatomic layer deposition; porous alumina membrane composite membranes; molecular separation
dc.titleAtomic layer deposition of SiO₂ on porous alumina membranes: Controlling the pore size and transport properties
dc.title.alternativeAtomic layer deposition of SiO(2) on porous alumina membranes: Controlling the pore size and transport properties
dc.typeConference paper
pubs.publication-statusPublished

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